Work

7nm logic optical lithography with OPC-Lite

Year: 2015

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2084846

Authors: Michael C. Smayling, Koichiro Tsujita, Hidetami Yaegashi, Valery Axelrad, Ryo Nakayama, Kenichi Oyama, Shohei Yamauchi, Hiroyuki Ishii, Koji Mikami

Institutions: Tela Innovations (United States), Canon (Japan), Tokyo Electron (Japan), Sequoia (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2013399533

FWCI: 0.832

Cites: 22

Cited by: 6

Related to: 10