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Author

Koichiro Tsujita

Observed name: K. Tsujita
Institution: Canon (Japan)
OpenAlex ID: A5110125615
Sub-12nm optical lithography with 4x pitch division and SMO-lite
2013 · Michael C. Smayling, Koichiro Tsujita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16
Improvement of lithographic performance and reduction of mask cost by simple OPC
2012 · Koichiro Tsujita, Koji Mikami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Sub-20nm logic lithography optimization with simple OPC and multiple pitch division
2012 · Michael C. Smayling, Valery Axelrad, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Supreme lithographic performance by simple mask layout based on lithography and layout co-optimization
2011 · Koichiro Tsujita, Tadashi Arai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Optical lithography applied to 20-nm CMOS Logic and SRAM
2011 · V. Axelrad, M. C. Smayling, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
7nm logic optical lithography with OPC-Lite
2015 · Michael C. Smayling, Koichiro Tsujita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Characterization of 1D layout technology at advanced nodes and low k1
2014 · V. Axelrad, K. Mikami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
11nm logic lithography with OPC-lite
2014 · Michael C. Smayling, Koichiro Tsujita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Optical lithography applied to 20nm CMOS Logic and SRAM
2011 · V. Axelrad, Michael C. Smayling, et al. · 3
OPC-Lite for gridded designs at low k1
2014 · V. Axelrad, M. Smayling, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Lithography and layout co-optimization beyond conventional OPC concept
2010 · Koichiro Tsujita, Koji Mikami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Illumination optimization with actual information of exposure tool and resist process
2007 · Koichiro Tsujita, Koji Mikami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Study of segmented overlay mark fidelity based on electrical property of device
2005 · Akiyuki Minami, Sachiko Yabe, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Test structure for fixing OPC of 200 nm pitch via chain using inner and outer dummy via array
2004 · T. Nasuno, Y. Matsubara, et al. · IEEE International Conference on Microelectronic Test Structures (ICMTS) · 1
Pitch-based pattern splitting for 1D layout
2015 · Ryo Nakayama, Hiroyuki Ishii, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Novel approaches to meet the requirements for double patterning
2009 · Takeaki Ebihara, Toshiyuki Yoshihara, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Innovative pattern matching method considering process margin and scanner design information
2009 · Koichiro Tsujita, Koji Mikami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Impact of optimization conditions on the result at optimizing illumination and mask
2008 · Koichiro Tsujita, Koji Mikami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Monitoring system of effective exposure dose and focus
2005 · Sachiko Yabe, Akiyuki Minami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 19
Citation count: 83
H-index: 6
I10-index: 3
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