Work

11nm logic lithography with OPC-lite

Year: 2014

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2045667

Authors: Michael C. Smayling, Koichiro Tsujita, Hidetami Yaegashi, Valery Axelrad, Ryo Nakayama, Kenichi Oyama, Arisa Hara

Institutions: Tela Innovations (United States), Canon (Japan), Tokyo Electron (Japan), Sequoia (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2003248585

FWCI: 1.604

Cites: 18

Cited by: 4

Related to: 10