Work

Extendibility of self-aligned type multiple patterning for further scaling

Year: 2013

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2011953

Authors: Shohei Yamauchi, Arisa Hara, Kenichi Oyama, Sakurako Natori, Masatoshi Yamato, Hidetami Yaegashi

Institution: Tokyo Electron (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2017694139

FWCI: 1.631

Cites:

Cited by: 6

Related to: 10