Recent progress on multipatterning: approach to pattern placement correction
Year: 2015
Type: conference-paper
DOI: 10.1117/12.2087003
Authors: Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, Sakurako Natori, Shohei Yamauchi, Masatoshi Yamato, Noriaki Okabe, Kyohei Koike
Institution: Tokyo Electron (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2002186598