Author

Katsuyuki Ohnishi

Observed names: K Ohnishi, K. Ohnishi, K.. Ohnishi, KATSUYUKI OHNISHI, Katsuyuki OHNISHI

Observed institutions: Konan University, Ehime University Hospital, Tachikawa Hospital, Renesas Electronics (Japan), Ehime University, Hitachi (Japan)

OpenAlex ID: A5110075575

Negative bias temperature instability of pMOSFETs with ultra-thin SiON gate dielectrics

2003 · S. Tsujikawa, T. Mine, et al. · IEEE International Reliability Physics Symposium proceedings · 78

Experimental evidence for the generation of bulk traps by negative bias temperature stress and their impact on the integrity of direct-tunneling gate dielectrics

2004 · S. Tsujikawa, K. Watanabe, et al. · Symposium on VLSI Technology · 31

Extrinsic Sympathetic Reinnervation After Intestinal Transplantation in Rats

1995 · HIDENORI KIYOCHI, ATSUMI ONO, et al. · Transplantation · 30

A raised source/drain technology using in-situ P-doped SiGe and B-doped Si for 0.1-μm CMOS ULSIs

2002 · T. Uchino, T. Shiba, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 14

Femto-second CMOS technology with high-k offset spacer and SiN gate dielectric with oxygen-enriched interface

2003 · R. Tsuchiya, K. Ohnishi, et al. · Symposium on VLSI Technology · 13

An ultra-thin silicon nitride gate dielectric with oxygen-enriched interface (OI-SiN) for CMOS with EOT of 0.9 nm and beyond

2003 · S. Tsujikawa, T. Mine, et al. · Symposium on VLSI Technology · 9

Extrinsic reinnervation one year after intestinal transplantation in rats.

1996 · H Kiyochi, A Ono, et al. · PubMed · 9

In situ phosphorus-doped polysilicon emitter technology for very high-speed, small emitter bipolar transistors

1996 · T. Shiba, T. Uchino, et al. · IEEE Transactions on Electron Devices · 9

Thick-Strained-Si/SiGe CMOS Technology With Selective-Epitaxial-Si Shallow-Trench Isolation

2007 · M.. Miyamoto, N.. Sugii, et al. · IEEE Transactions on Electron Devices · 6

Improving gate oxide integrity (GOI) of a W/WNx/dual-poly Si stacked-gate by using wet-hydrogen oxidation in 0.14-μm CMOS devices

2002 · K. Ohnishi, N. Yamamoto, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 6

Quantitative measurements of balloon-to-artery ratios in coronary angioplasty.

1991 · A Azuma, T Sawada, et al. · PubMed · 6

Extrinsic Sympathetic Reinnervation After Intestinal Transplantation in Rats

1995 · HIDENORI KIYOCHI, ATSUMI ONO, et al. · Transplantation · 5

Synchronous watt torque feedback control of induction motor drives.

1987 · Fumio Harashima, Seiji Kondo, et al. · IEEE Industry Applications Society Annual Meeting (IAS) · 5

Optical properties of self-assembled InAs quantum dots grown on GaAs(211)A substrate

2000 · A Sugimura, K Ohnishi, et al. · Thin Solid Films · 3

Techniques for reading DVD-RAM disc with DVD-ROM drives

1999 · K. Izumi, K. Ohnishi, et al. · IEEE Transactions on Consumer Electronics · 3

Extrinsic nerve preservation technique for intestinal transplantation in rats.

1995 · H Kiyochi, A Ono, et al. · PubMed · 3

Strain mapping technique for performance improvement of strained MOSFETs with scanning transmission electron microscopy

2008 · N. Nakanishi, S. Kudo, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 2

A 50-nm CMOS technology for high-speed, low-power, and RF applications in 100-nm node SoC platform

2002 · K. Ohnishi, R. Tsuchiya, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 2

Intestinal Transplantation With Extrinsic Nerve Preservation in Rats Development of a New Experimental Model

1995 · HIDENORI KIYOCHI, ATSUMI ONO, et al. · Transplantation · 2

[Regional myocardial coronary blood flow reserve in hypertrophic cardiomyopathy assessed by digital subtraction coronary angiography].

1992 · S Terashima, T Nakamura, et al. · PubMed · 2

Application of smart watch in navigation system for oral implant surgery

2017 · S. Usuda, K. Yu, et al. · International Journal of Oral and Maxillofacial Surgery · 1

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Thick-Strained-Si/SiGe CMOS Technology with Selective-Epitaxial-Si Shallow-Trench Isolation (SES-STI)

2006 · M. Miyamoto, N. Sugii, et al. · 2006 International SiGe Technology and Device Meeting · 1

DVD-RAM disc reproducing techniques for DVD-ROM drives

2003 · K. Izumi, K. Ohnishi, et al. · International Conference on Consumer Electronics · 1

Sub-10-ps gate delay by reducing the current crowding effect at an extension

2002 · D. Hisamoto, K. Umeda, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 1

0.1-μm CMOS technology for high-speed logic and system LSIs with SiO/SiN/poly-Si/W gate-system

2003 · T. Onai, S. Tsujikawa, et al. · Technical digest - International Electron Devices Meeting/Technical digest

Works count: 40

Citation count: 242

H-index: 8

I10-index: 5