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Sunfei Fang
Institution:
IBM (United States)
Observed institution:
IBM (United States)
OpenAlex ID:
A5110084374
Performance analysis and modeling of deep trench decoupling capacitor for 32 nm high-performance SOI processors and beyond
2012
·
Balaji Jayaraman
, Sneha Gupta
, et al.
·
IEEE International Conference on IC Design and Technology (ICICDT)
·
13
Low-k spacers for advanced low power CMOS devices with reduced parasitic capacitances
2008
·
Elbert Huang
, Eric Joseph
, et al.
·
IEEE International SOI Conference (SOI)
·
10
Channel Strain Characterization in Embedded SiGe by Nano-beam Diffraction
2008
·
Jinghong Li
, Angela Lamberti
, et al.
·
ECS Transactions
·
4
PDF
Channel Strain Characterization in Embedded SiGe by Nano-beam Diffraction
2008
·
Jinghong Li
, Angela Lamberti
, et al.
·
ECS Meeting Abstracts
PDF
Fully Silicided (FUSI) Gate Technology as a Metal Gate Option for Advanced CMOS
2006
·
E. Gusev
, Cyril Cabral
, et al.
·
ECS Meeting Abstracts
PDF
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Works count:
5
Citation count:
27
H-index:
3
I10-index:
2
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