Work

Low-k spacers for advanced low power CMOS devices with reduced parasitic capacitances

Year: 2008

Type: conference-paper

Source: IEEE International SOI Conference (SOI)

DOI: 10.1109/soi.2008.4656274

Authors: Elbert Huang, Eric Joseph, Huiming Bu, Xinlin Wang, Nicholas Fuller, Christine Ouyang, Eva Simonyi, Hosadurga Shobha, Tien Cheng, Anupama Mallikarjunan, Isaac Lauer, Sunfei Fang, Wilfried Haensch, Chun-Yung Sung, Sampath Purushothaman, Ghavam Shahidi

Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2017430071

FWCI:

Cites: 2

Cited by: 10

Related to: 10