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Masis M. Mkrtchyan

Observed names: M M Mkrtchyan, M. M. Mkrtchyan, M. Mkrtchyan, M.M. Mkrtchyan, Masis Mkrtchyan
OpenAlex ID: A5110106443
Stochastic scattering in charged particle projection systems: A nearest neighbor approach
1995 · M. M. Mkrtchyan, J. A. Liddle, et al. · Journal of Applied Physics · 41
Space charge effects in projection charged particle lithography systems
1995 · L. R. Harriott, S. D. Berger, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 33
Electron scattering and transmission through SCALPEL masks
1998 · M. M. Mkrtchyan, J. A. Liddle, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 23
The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System
1995 · J. Alexander Liddle, Steven D. Berger, et al. · Japanese Journal of Applied Physics · 21
An analytical model of stochastic interaction effects in projection systems using a nearest-neighbor approach
1994 · M. M. Mkrtchyan, J. A. Liddle, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 20
Electron-optical design for the SCALPEL proof-of-concept tool
1995 · Warren K. Waskiewicz, Steven D. Berger, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16
Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system
2001 · J. A. Liddle, M. I. Blakey, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 14
SCALPEL proof-of-concept system: preliminary lithography results
1997 · Warren K. Waskiewicz, Christopher J. Biddick, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
SCALPEL system
1994 · Steven D. Berger, Christopher J. Biddick, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Electron Scattering and Related Phenomena in Scattering with Angular Limitation Projection Electron Lithography (SCALPEL*)
2000 · Masis M. Mkrtchyan · Japanese Journal of Applied Physics · 8
SCALPEL mask-membrane charging
1999 · M. Mkrtchyan, A. Gasparyan, et al. · Microelectronic Engineering · 8
High accuracy electron beam model development in MICHELLE: eBEAM
2010 · Serguei G. Ovtchinnikov, Simon J. Cooke, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 7
Critical issues for developing a high-throughput SCALPEL system for sub-0.18-um lithography generations
1998 · Stuart T. Stanton, James A. Liddle, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Space-charge results from the SCALPEL proof-of-concept system
1999 · James A. Liddle, Myrtle I. Blakey, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Determination of the possible magnitude of the charging effect in a SCALPEL mask membrane
1999 · M. M. Mkrtchyan, A. S. Gasparyan, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 5
Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL)
1998 · J.A. Liddle, M.I. Blakey, et al. · Microelectronic Engineering · 5
Precise measurement of the effective backscatter coefficient for 100-keV electron-beam lithography on Si
1995 · G. Patrick Watson, Steven D. Berger, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 5
SCALPEL aerial image monitoring: Principles and application to space charge
2000 · G. M. Gallatin, R. C. Farrow, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 4
Quantitation of latent resist images using photon tunneling microscopy
1998 · J. A. Liddle, J. A. Johnson, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 4
Photon tunneling microscopy of latent resist images
1997 · J. A. Liddle, A. T. Fernandez, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 4
Modeling of electron backscattering from topographic marks
1996 · M. M. Mkrtchyan, R. C. Farrow · Journal of Applied Physics · 4
A possible mechanism of relaxation over the rotational sublevels of molecules under conditions of saturation of a vibrational–rotational transition
1978 · M M Mkrtchyan, Viktor T Platonenko · Soviet Journal of Quantum Electronics · 4
Modeling of counter streaming charged beams in MICHELLE-eBEAM
2013 · Serguei G. Ovtchinnikov, Simon J. Cooke, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 3
Global space charge effect in SCALPEL
2000 · M. Mkrtchyan, E. Munro, et al. · Microelectronic Engineering · 3
Mark topography for alignment and registration in projection electron lithography
1996 · Reginald C. Farrow, Masis M. Mkrtchyan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Works count: 49
Citation count: 294
H-index: 9
I10-index: 9
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