Author

Bjoern A. M. Hansson

Institution: KTH Royal Institute of Technology

Observed institution: KTH Royal Institute of Technology

OpenAlex ID: A5110119896

Status of the liquid-xenon-jet laser-plasma source for EUV lithography

2002 · Bjoern A. M. Hansson, Lars Rymell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 30

Xenon liquid-jet laser plasma source for EUV lithography

2000 · Bjoern A. M. Hansson, Magnus Berglund, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

Liquid-xenon-jet laser-plasma source for EUV lithography

2001 · Bjoern A. M. Hansson, Lars Rymell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12

X-ray and EUV laser-plasma sources based on cryogenic liquid-jet target

1999 · Lars Rymell, Magnus Berglund, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Target analysis of laser plasma droplet-target system

2000 · Oscar E. Hemberg, Bjoern A. M. Hansson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Liquid-target laser-plasma sources for EUV and x-ray lithography

1999 · Hans M. Hertz, Magnus Berglund, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Works count: 6

Citation count: 65

H-index: 4

I10-index: 3