Work

Liquid-xenon-jet laser-plasma source for EUV lithography

Year: 2001

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.450943

Authors: Bjoern A. M. Hansson, Lars Rymell, Magnus Berglund, Oscar E. Hemberg, Emmanuelle Janin, Jalmar Thoresen, Hans M. Hertz

Institution: KTH Royal Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2156103807

FWCI: 6.921

Cites: 15

Cited by: 12

Related to: 10