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Wmm Erwin Kessels
Observed names:
Kessels, W.M.M.,
Kessels, WMM Erwin,
W. M. M. Kessels,
W.M.M. Kessels
Observed institution:
Eindhoven University of Technology
OpenAlex ID:
A5111430799
Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
2011
·
M. E. Donders
, H. C. M. Knoops
, et al.
·
Journal of The Electrochemical Society
·
79
PDF
High-Efficiency n-Type Silicon Solar Cells with Front Side Boron Emitter
2009
·
Benick, J.
, Hoex, B.
, et al.
·
TU/e Research Portal
·
50
Ion Bombardment during Plasma-Assisted Atomic Layer Deposition
2013
·
Harald Benjamin Profijt
, W.M.M. Kessels
·
ECS Transactions
·
26
PDF
Recent Progress in the Development and Understanding of Silicon Surface Passivation by Aluminum Oxide for Photovoltaics
2010
·
Dingemans, G.
, Kessels, W.M.M.
·
TU/e Research Portal
·
17
On combining surface and bulk passivation of SiN/sub x/:H layers for mc-Si solar cells
2003
·
W.J. Soppe
, J. Hong
, et al.
·
Conference record of the IEEE Photovoltaic Specialists Conference
·
10
On the Growth, Percolation and Wetting of Silver Thin Films Grown by Atmospheric-Plasma Enhanced Spatial Atomic Layer Deposition
2016
·
Alfredo Mameli
, Fieke van den Bruele
, et al.
·
ECS Transactions
·
7
PDF
Quantitative Characterization of Dry Textured Silicon Surfaces
2009
·
Souren, F.M.M.
, Van De Sanden, M.C.M.
, et al.
·
TU/e Research Portal
·
5
Selective in-situ atomic layer deposition on structures created with EBID
2011
·
Mackus, AJM Adrie
, Kessels, WMM Erwin
, et al.
·
TU/e Research Portal
·
4
Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
2013
·
Valentino Longo
, F. Roozeboom
, et al.
·
ECS Transactions
·
3
PDF
Advanced front-surface passivation schemes for industrial n-type silicon solar cells
2014
·
van de Bwh Bas Loo
, G. Dingemans
, et al.
·
TNO Repository
·
2
PDF
Industrial high-rate (≥ 4 nm/s) deposited silicon nitride with low surface recombination velocities under optimum antireflection coating conditions
2005
·
Bram Hoex
, van Ajm Erven
, et al.
·
TU/e Research Portal
·
2
Improved thermally stable surface and bulk passivation of PECVD SiN/sub x/:H using N/sub 2/ and SiH/sub 4/
2003
·
A.W. Weeber
, H.C. Rieffe
, et al.
·
TU/e Research Portal
·
2
Attenuated total reflection infrared spectroscopic study of hydrogenated amorphous and microcrystalline silicon film evolution
2003
·
van den Pj Peter Oever
, I.J. Houston
, et al.
·
TU/e Research Portal
·
2
Remote plasma deposition of hydrogenated amorphous silicon : plasma processes, film growth, and material properties
2000
·
Kessels, WMM Erwin
·
TU/e Research Portal
·
2
PDF
In situ spectroscopic ellipsometry for atomic layer deposition
2009
·
E. Langereis
, Sbs Stephan Heil
, et al.
·
TU/e Research Portal
·
1
Investigation of AI2O3 deposited by ALD as passivation layers for InP-based nano lasers
2008
·
U Uzma Khalique
, Mjh Milan Marell
, et al.
·
TU/e Research Portal
·
1
Influence of the Structural and Compositiional Properties of PECVD Silicon Nitride Layers on the Passivaton of AlGaN/GaN HRMT's
2008
·
Karouta, F.K.
, Kramer, M.C.J.C.M
, et al.
·
Radboud Repository (Radboud University)
·
1
In situ film transmittance using the plasma as light source: a case study of thin silicon film deposition in the microcrystalline growth regime
2007
·
G. Dingemans
, van den Mn Menno Donker
, et al.
·
RWTH Publications (RWTH Aachen)
·
1
High-rate deposition of silicon nitride and silicon oxide films for surface passivation and (anti)reflection coating applications
2005
·
Bram Hoex
, Fjj Floran Peeters
, et al.
·
TU/e Research Portal
·
1
Diagnostics needs for understanding plasma assisted deposition
1997
·
DC Daan Schram
, Mgh Maarten Boogaarts
, et al.
·
TU/e Research Portal
·
1
Fast Deposition of Device Quality Hydrogenated Amorphous Silicon by an Expanding Thermal Plasma
2023
·
W.M.M. Kessels
, M.C.M. van de Sanden
, et al.
·
International Thermal Plasma Processes Conference (TPP)
Isotropic ALE of ZnO using Hacac and O2 plasma
2019
·
Alfredo Mameli
, Verheijen
, et al.
·
TNO Repository
Area-selective ALD of SiO2 using acetylacetone as inhibitor in a three-step cycle
2017
·
Alfredo Mameli
, Maarten Merkx
, et al.
·
TNO Repository
A novel process for Atomic Layer Etching of ZnO using acetylacetone and remote O2 plasma
2017
·
Alfredo Mameli
, Verheijen
, et al.
·
TNO Repository
Een nieuwe atoomlaagdepositieproces voor efficiëntere zonnecellen
2016
·
Mfj Martijn Vos
, Bart Macco
, et al.
·
TU/e Research Portal
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Works count:
108
Citation count:
217
H-index:
6
I10-index:
5
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