Improved thermally stable surface and bulk passivation of PECVD SiN/sub x/:H using N/sub 2/ and SiH/sub 4/
Year: 2003
Type: other
Source: TU/e Research Portal
Institution: Energy Research Centre of the Netherlands
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2129015165
