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T. Hiraoka
Observed names:
Hiraoka, T.,
Hiraoka, Takayuki,
Takayuki Hiraoka
Observed institution:
Toshiba (Japan)
OpenAlex ID:
A5111461168
A resume-standby application processor for 3G cellular phones
2004
·
T. Kamei
, M. Ishikawa
, et al.
·
Digest of technical papers/Digest of technical papers - IEEE International Solid-State Circuits Conference
·
43
A review of narrow-channel effects for STI MOSFET's: A difference between surface- and buried-channel cases
1999
·
Naoyuki Shigyo
, Takayuki Hiraoka
·
Solid-State Electronics
·
28
An investigation of input protection for CDM robustness in 40nm CMOS technology
2009
·
Yasuyuki Morishita
, H. Ishizuka
, et al.
·
11
New protection techniques and test chip design for achieving high CDM robustness
2008
·
K. Watanabe
, T. Hiraoka
, et al.
·
Electrical Overstress/Electrostatic Discharge Symposium
·
10
Breakdown Voltage Prediction of Ultra-Thin Gate Insulator in Electrostatic Discharge (ESD) Based on Anode Hole Injection Model
2006
·
A. Kinoshita
, Y. Mitani
, et al.
·
IEEE International Reliability Physics Symposium proceedings
·
7
Novel Method for Simultaneous Formation of Wires and Vias of a Printed Circuit Board Using Nanoporous Body
2006
·
K. Asakawa
, S. Matake
, et al.
·
IEEE Transactions on Advanced Packaging
·
2
MOSFET design of 100 nm node low standby power CMOS technology compatible with embedded trench DRAM and analog devices
2002
·
A. Oishi
, R. Hasumi
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
2
Fabrication of HOM-Free Linear Accelerating Structure Using Choke Mode Cavity for Japan Linear Collider
1994
·
A. Miura
, H. Baba
, et al.
·
1
Impact of difference between discharging methods on CDM testing
2010
·
Yasuyuki Morishita
, H. Ishizuka
, et al.
·
Electrical Overstress/Electrostatic Discharge Symposium
CCDC 634212: Experimental Crystal Structure Determination
2009
·
Abbaz, T.
, Gouasmia, A.-K.
, et al.
·
The Cambridge Structural Database
CCDC 618831: Experimental Crystal Structure Determination
2007
·
Hiraoka, T.
, Fujiwara, H.
, et al.
·
The Cambridge Structural Database
CCDC 618833: Experimental Crystal Structure Determination
2007
·
Hiraoka, T.
, Fujiwara, H.
, et al.
·
The Cambridge Structural Database
CCDC 618834: Experimental Crystal Structure Determination
2007
·
Hiraoka, T.
, Fujiwara, H.
, et al.
·
The Cambridge Structural Database
CCDC 618830: Experimental Crystal Structure Determination
2007
·
Hiraoka, T.
, Fujiwara, H.
, et al.
·
The Cambridge Structural Database
CCDC 618832: Experimental Crystal Structure Determination
2007
·
Hiraoka, T.
, Fujiwara, H.
, et al.
·
The Cambridge Structural Database
Breakdownvoltageprediction Ofultra-thin Gateinsulator in Electrostatic Discharge (esd)basedonanodeholeinjection Model
2006
·
Akimasa Kinoshita
, Y. Mitani
, et al.
CCDC 291038: Experimental Crystal Structure Determination
2006
·
Fujiwara, H.
, Wada, K.
, et al.
·
The Cambridge Structural Database
CCDC 271655: Experimental Crystal Structure Determination
2006
·
Hiraoka, T.
, Kamada, Y.
, et al.
·
The Cambridge Structural Database
CCDC 271654: Experimental Crystal Structure Determination
2006
·
Hiraoka, T.
, Kamada, Y.
, et al.
·
The Cambridge Structural Database
CCDC 271657: Experimental Crystal Structure Determination
2006
·
Hiraoka, T.
, Kamada, Y.
, et al.
·
The Cambridge Structural Database
CCDC 271656: Experimental Crystal Structure Determination
2006
·
Hiraoka, T.
, Kamada, Y.
, et al.
·
The Cambridge Structural Database
Nano-patterning using an embedded particle monolayer as an etch mask
2004
·
T. Nakanishi
, T. Hiraoka
, et al.
·
International Microprocesses and Nanotechnology Conference (MNC)
Nano-lithography using self-assembled block-copolymer for patterned media
2003
·
K. Asakawa
, T. Hiraoka
, et al.
·
International Microprocesses and Nanotechnology Conference (MNC)
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Works count:
24
Citation count:
104
H-index:
5
I10-index:
4
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