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Eddy van der Heijden

Observed name: Eddy Van der Heijden
Institution: ASML (Netherlands)
OpenAlex ID: A5111534834
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
2007 · Mircea Dusa, John Quaedackers, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 92
Wafer based mask characterization for double patterning lithography
2008 · Robert de Kruif, Karsten Bubke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Characterization of ArF immersion process for production
2005 · Jeng-Horng Chen, Li-Jui Chen, et al. · Optical Microlithography XVIII · 10
Reduced pellicle impact on overlay using high order intrafield grid corrections
2009 · Robert de Kruif, Tasja van Rhee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
The Borsele files: the challenge of acquiring usable data under chaotic circumstances
2008 · Rianne Gouman, Masja Kempen, et al. · International Journal of Emergency Management · 3
Random 65nm..45nm C/H printing using optimized illumination source and CD sizing by post processing
2008 · Jo Finders, Eddy Van der Heijden, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
A single-exposure approach for patterning 45nm flash/DRAM contact hole mask
2006 · Ting Chen, Doug Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination
2006 · Ting Chen, Doug Van Den Broeke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 8
Citation count: 122
H-index: 4
I10-index: 3
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