Characterization of ArF immersion process for production
Year: 2005
Type: conference-paper
Source: Optical Microlithography XVIII
DOI: 10.1117/12.602025
Authors: Jeng-Horng Chen, Li-Jui Chen, Tun-Ying Fang, Tzung-Chi Fu, Lin-Hung Shiu, Yao-Te Huang, Norman Chen, Da-Chun Oweyang, Ming-Che Wu, Shih-Che Wang, John C. Lin, Chun-Kuang Chen, Wei-Ming Chen, Tsai-Sheng Gau, Burn J. Lin, Richard Moerman, Wendy Gehoel-van Ansem, Eddy van der Heijden, Fred de Jong, Dorothe Oorschot, Herman Boom, Martin Hoogendorp, Christian Wagner, Bert Koek
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1970734331