Author

Li-Jui Chen

Institution: Taiwan Semiconductor Manufacturing Company (Taiwan)

Observed institutions: National Yang Ming Chiao Tung University, National Tsing Hua University, Taiwan Semiconductor Manufacturing Company (Taiwan), Industrial Technology Research Institute

OpenAlex ID: A5000778531

Characterization of ArF immersion process for production

2005 · Jeng-Horng Chen, Li-Jui Chen, et al. · Optical Microlithography XVIII · 10

The non-metallic conductivity of Nb3Ge films sputtered on silicon substrates

1994 · Li-Jui Chen, Jyh-Haur Tyan, et al. · Journal of Physics and Chemistry of Solids · 7

Characterization of charging in CD-SEM for 90-nm metrology and beyond

2003 · Li-Jui Chen, Shang-Wei Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

More on the Magnus–Derek game

2010 · Li-Jui Chen, Jinn-Jy Lin, et al. · Theoretical Computer Science · 5

Focus latitude enhancement of symmetrical phase mask design for deep submicron contact hole patterning

2001 · Shuo-Yen Chou, Jen-Chung Lou, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 4

Customized off-axis illumination aperture filtering for sub-0.18-μm KrF lithography

1999 · Chin C. Hsia, Tsai-Sheng Gau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Overlay and focus stability control for 28-nm nodes on immersion scanners

2011 · Guo-Tsai Huang, Kai-Hsiung Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects

2007 · Lin-Hung Shiu, Fu-Jye Liang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Immersion defect reduction, part I: analysis of water leaks in an immersion scanner

2007 · Fu-Jye Liang, Hsing Chang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Application of scatterometry for CD and profile metrology in 193-nm lithography process development

2003 · Li-Jui Chen, Chih-Ming Ke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Evaluating the impact of spherical aberration on sub-0.2-μm contact/via hole patterning

2001 · Shuo-Yen Chou, Jen-Chung Lou, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Lithography challenges of dual-damascence process in 0.13 μm era

2001 · Li-Jui Chen, Lin-Hung Shiu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

High-transmission PSM inspection sensitivity

1999 · Chunhung Wu, David Wang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Antireflection strategies for sub-0.18-μm dual-damascene structure patterning in KrF 248-nm lithography

1999 · Shuo-Yen Chou, Chien-Ming Wang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

General scaling law of optical lithography optical theory

2004 · Chun-Kuang Chen, Tsai-Sheng Gau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Novel negative photoresist process for 0.18 μm dual damascene

2001 · Lin-Hung Shiu, Chih-Ming Lai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 16

Citation count: 46

H-index: 4

I10-index: 1