Work

Application of scatterometry for CD and profile metrology in 193-nm lithography process development

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.483692

Authors: Li-Jui Chen, Chih-Ming Ke, Shinn Sheng Yu, Tsai-Sheng Gau, Pei-Hung Chen, Yao Ching Ku, Burn J. Lin, Dan Engelhard, Dave Hetzer, Jason Y. Yang, Kelly A. Barry, Lip Yap, Wenge Yang

Institution: Taiwan Semiconductor Manufacturing Company (Taiwan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2048492017

FWCI: 0.449

Cites:

Cited by: 1

Related to: 10