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Author

Frank Sobel

Observed name: F. Sobel
Institution: Schott (Germany)
OpenAlex ID: A5111627331
Polymer thin-film distributed feedback tunable lasers
2000 · Vincent Dumarcher, Licinio Rocha, et al. · Journal of Optics A Pure and Applied Optics · 52
Multimode distributed feedback laser emission in a dye-doped optically pumped polymer thin-film
2004 · F. Sobel, D. Gindre, et al. · Optical Materials · 15
Absorber stack optimization toward EUV lithography mask blank pilot production
2004 · Frank Sobel, Lutz Aschke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
High-throughput EUV reflectometer for EUV mask blanks
2004 · Rainer Lebert, Christian Wies, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Effect of electrostatic chucking on EUVL mask flatness
2004 · Andrew R. Mikkelson, Roxann L. Engelstad, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
High-performance 6-inch EUV mask blanks produced under real production conditions by ion-beam sputter deposition
2002 · Hans W. Becker, Frank Sobel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Recent results on EUV mask blank multilayers and absorbers
2005 · Holger Seitz, Frank Sobel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography
2003 · Hans W. Becker, Jay Chey, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Update on the EUVL mask blank activity at Schott Lithotec
2003 · Frank Sobel, Lutz Aschke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Production challenges of making EUV mask blanks
2005 · Holger Seitz, Frank Sobel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM
2004 · Hans W. Becker, Pascal Schley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
SiO 2 buffer-etch processes with a TaN absorber for EUV mask fabrication
2004 · Florian Letzkus, Joerg Butschke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Spectral characteristics of DFB polymer lasers
2000 · Vincent Dumarcher, Licinio Rocha, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
High speed reflectometer for EUV mask-blanks
2005 · Christian Wies, Rainer Lebert, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
High speed reflectometer for EUV mask-blanks
2005 · C. Wies, R. Lebert, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Performance data on new tunable attenuating PSM for 193-nm and 157-nm lithography
2004 · Hans W. Becker, Frank Schmidt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Production challenges of making an EUV mask blank
2004 · Lutz Aschke, Hans W. Becker, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber
2004 · Frank Sobel, Lutz Aschke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Laser action in periodically structured polymer films
1999 · Jean-Michel Nunzi, Frank Sobel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 19
Citation count: 107
H-index: 5
I10-index: 2
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