Work

Effect of electrostatic chucking on EUVL mask flatness

Year: 2004

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.568014

Authors: Andrew R. Mikkelson, Roxann L. Engelstad, Edward G. Lovell, Lutz Aschke, Frauke Rueggeberg, Frank Sobel

Institutions: University of Wisconsin–Madison, Schott (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Intel Corporation, Microsoft, Defense Advanced Research Projects Agency, Lawrence Livermore National Laboratory

OpenAlex ID: W2018134338

FWCI: 1.66

Cites:

Cited by: 5

Related to: 10