2000 · D. L. White, O. R. Wood · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 52

Active CdS Ultrasonic Oscillator

1966 · D. L. White, Wen-Chung Wang · Physical Review · 45

Liquid-crystal light valves

1970 · D.L. White, M. Feldman · Electronics Letters · 36

Soft-x-ray projection lithography: printing of 02-μm features using a 20:1 reduction

1990 · D. W. Berreman, J. H. Bruning, et al. · Optics Letters · 32

The Depletion Layer Transducer

1962 · D.L. White · IRE Transactions on Ultrasonic Engineering · 29

Synchrotron radiation sources and condensers for projection x-ray lithography

1993 · J. B. Murphy, D. L. White, et al. · Applied Optics · 26

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Ultrasonic amplification in sulfur doped CdS

1965 · D.L. White, E.T. Handelman, et al. · Proceedings of the IEEE · 25

Diffraction-limited soft x-ray projection lithography with a laser plasma source

1991 · G. D. Kubiak, D. A. Tichenor, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 23

Reflective mask technologies and imaging results in soft x-ray projection lithography

1991 · D. M. Tennant, J. E. Bjorkholm, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 23

Use of trilevel resists for high-resolution soft-x-ray projection lithography

1990 · D. W. Berreman, J. E. Bjorkholm, et al. · Applied Physics Letters · 20

20:1 projection soft x-ray lithography using trilevel resist

1990 · Tanya E. Jewell, M. M. Becker, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14

Modification of the coherence of undulator radiation

1995 · D. L. White, O. R. Wood, et al. · Review of Scientific Instruments · 13

Soft-x-ray projection lithography experiments using Schwarzschild imaging optics

1993 · D. A. Tichenor, G. D. Kubiak, et al. · Applied Optics · 12

Soft x-ray projection lithography using a 1:1 ring field optical system

1991 · A. A. MacDowell, J. E. Bjorkholm, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 12

Application of zone plates to alignment in microlithography

1981 · M. Feldman, A. D. White, et al. · Journal of Vacuum Science and Technology · 10

Development of a laboratory extreme-ultraviolet lithography tool

1994 · Daniel A. Tichenor, Glenn D. Kubiak, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Use of attenuated phase masks in extreme ultraviolet lithography

1997 · O. R. Wood, D. L. White, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 8

Interaction of optical and acoustic phonons with longitudinal plasma waves

1965 · Raphael Tsu, Donald L. White · Annals of Physics · 8

Works count: 76

Citation count: 3,119

H-index: 17

I10-index: 22