Work

Soft-x-ray projection lithography: printing of 02-μm features using a 20:1 reduction

Year: 1990

Type: article

Source: Optics Letters

DOI: 10.1364/ol.15.000529

Authors: D. W. Berreman, J. H. Bruning, J. E. Bjorkholm, L. Eichner, R. R. Freeman, T. E. Jewell, W. M. Mansfield, A. A. MacDowell, M. L. O’Malley, E. L. Raab, W. T. Silfvast, L. H. Szeto, D. M. Tennant, W. K. Waskiewicz, D. L. White, D. L. Windt, O. R. Wood

Institution: AT&T (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1978143552

FWCI: 11.7

Cites: 7

Cited by: 32

Related to: 10