Author

Guo-Tsai Huang

Institution: Taiwan Semiconductor Manufacturing Company (Taiwan)

Observed institutions: National Taiwan University, Taiwan Semiconductor Manufacturing Company (Taiwan)

OpenAlex ID: A5111744786

Evaluation of a novel ultra small target technology supporting on-product overlay measurements

2012 · Henk-Jan H. Smilde, Arie den Boef, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 38

On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

2013 · Kaustuve Bhattacharyya, Chih-Ming Ke, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 28

Accuracy of diffraction-based and image-based overlay

2011 · Chih-Ming Ke, Guo-Tsai Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22

A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection

2017 · Kaustuve Bhattacharyya, Arie den Boef, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16

Multi-wavelength approach towards on-product overlay accuracy and robustness

2018 · Guo-Tsai Huang, Cathy Wang, et al. · Metrology, Inspection, and Process Control XXXVI · 13

Evaluation of elastic properties of submicrometer thin films using slanted finger interdigital transducers

2005 · Tsung-Tsong Wu, Yung-Yu Chen, et al. · Journal of Applied Physics · 12

Mask registration impact on intrafield on-wafer overlay performance

2011 · Guo-Tsai Huang, Alex Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Sub-nanometer in-die overlay metrology: measurement and simulation at the edge of finiteness

2013 · Henk-Jan H. Smilde, Martin Jak, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Color mixing in overlay metrology for greater accuracy and robustness

2019 · Simon Mathijssen, Marc Noot, et al. · Metrology, Inspection, and Process Control XXXVI · 6

Advanced litho-cluster control via integrated in-chip metrology

2013 · Kaustuve Bhattacharyya, Henk-Jan H. Smilde, et al. · ASMC proceedings · 4

Application of advanced diffraction based optical metrology overlay capabilities for high-volume manufacturing

2017 · Kai-Hsiung Chen, Guo-Tsai Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Overlay and focus stability control for 28-nm nodes on immersion scanners

2011 · Guo-Tsai Huang, Kai-Hsiung Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Works count: 12

Citation count: 159

H-index: 7

I10-index: 6