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Nelson Tam
Observed name:
Nelson N. Tam
Institution:
Marvell (United States)
Observed institutions:
Intel (United States),
University of California System,
RIKEN,
Marvell (United States),
Marvell (Israel),
University of California, Berkeley
show all 6
OpenAlex ID:
A5111751653
Muon-Induced Single Event Upsets in Deep-Submicron Technology
2010
·
Brian D. Sierawski
, Marcus H. Mendenhall
, et al.
·
IEEE Transactions on Nuclear Science
·
123
A Comparison of the SEU Response of Planar and FinFET D Flip-Flops at Advanced Technology Nodes
2016
·
Patrick Nsengiyumva
, Dennis R. Ball
, et al.
·
IEEE Transactions on Nuclear Science
·
91
Effects of scaling on muon-induced soft errors
2011
·
Brian D. Sierawski
, Robert A. Reed
, et al.
·
IEEE International Reliability Physics Symposium proceedings
·
77
Thermal neutron soft error rate for SRAMS in the 90NM–45NM technology range
2010
·
ShiJie Wen
, Richard Wong
, et al.
·
IEEE International Reliability Physics Symposium proceedings
·
35
B10 finding and correlation to thermal neutron soft error rate sensitivity for SRAMs in the sub-micron technology
2010
·
Shi-Jie Wen
, S.Y. Pai
, et al.
·
IEEE International Integrated Reliability Workshop final report
·
31
Bias dependence of muon-induced single event upsets in 28 nm static random access memories
2014
·
Brian D. Sierawski
, Bharat Bhuva
, et al.
·
IEEE International Reliability Physics Symposium proceedings
·
30
Hardness Assurance Testing for Proton Direct Ionization Effects
2012
·
James R. Schwank
, Marty R. Shaneyfelt
, et al.
·
IEEE Transactions on Nuclear Science
·
29
PDF
Hardness assurance testing for proton direct ionization effects
2011
·
James R. Schwank
, Marty R. Shaneyfelt
, et al.
·
European Conference on Radiation and Its Effects on Components and Systems
·
6
Ever-increasing role of mask technology in deep submicron lithography
1994
·
Fu-Chang Lo
, Giang T. Dao
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Determination Of Quantitative Resist Models From Experiment
1988
·
William R. Bell II
, Philip D. Flanner III
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Characterization of electron-beam exposed optical resist
1988
·
Nelson N. Tam
, Rick D. Coyne
, et al.
·
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
·
3
Interferometric measurement of etch depths in phase-shift masks
1993
·
Patrick M. Troccolo
, Donald K. Cohen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Resist parameter extraction with graphical user interface in X
1991
·
Anita S. Chiu
, Richard A. Ferguson
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Exploratory test structures for characterization of electron-beam lithography
1989
·
Nelson Tam
, Hiroshi Nozue
, et al.
·
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
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Works count:
14
Citation count:
432
H-index:
7
I10-index:
7
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