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Tomoyuki Ando
Observed name:
T. Ando
Institution:
Tokyo Ohka Kogyo (Japan)
Observed institutions:
Agency for Science, Technology and Research,
Georgia Institute of Technology,
Kyoto University,
Institute of Microelectronics,
Tokyo Ohka Kogyo (Japan),
Yokohama City University
show all 6
OpenAlex ID:
A5111759211
Proton Dynamics in Chemically Amplified Electron Beam Resists
2004
·
Hiroki Yamamoto
, Takahiro Kozawa
, et al.
·
Japanese Journal of Applied Physics
·
169
Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography
2005
·
Hiroki Yamamoto
, Takahiro Kozawa
, et al.
·
Japanese Journal of Applied Physics
·
119
PDF
Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists
2004
·
Hiroki Yamamoto
, Takahiro Kozawa
, et al.
·
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
·
43
Study on acid generation from polymer
2005
·
Hiroki Yamamoto
, Takahiro Kozawa
, et al.
·
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
·
27
Reaction mechanism of fluorinated chemically amplified resists
2006
·
Hiroki Yamamoto
, Takahiro Kozawa
, et al.
·
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
·
24
Organic Damascene Process for 1.5- $\mu$ m Panel-Scale Redistribution Layer Technology Using 5- $\mu$ m-Thick Dry Film Photosensitive Dielectrics
2018
·
Fuhan Liu
, Chandrasekharan Nair
, et al.
·
IEEE Transactions on Components Packaging and Manufacturing Technology
·
18
Reaction Mechanisms of Brominated Chemically Amplified Resists
2005
·
Hiroki Yamamoto
, Takahiro Kozawa
, et al.
·
Japanese Journal of Applied Physics
·
17
Synthesis, physicochemical properties and photocytotoxicity of five new δ-substituted chlorin e6 derivatives
1990
·
Tomoyuki Ando
, Kazuhiro Irie
, et al.
·
Tetrahedron
·
15
Demonstration of 2µm RDL wiring using dry film photoresists and 5µm RDL via by projection lithography for low-cost 2.5D panel-based glass and organic interposers
2015
·
Ryuta Furuya
, Hao Lu
, et al.
·
IEEE Electronic Components and Technology Conference (ECTC)
·
14
Next Generation Panel-Scale RDL with Ultra Small Photo Vias and Ultra-Fine Embedded Trenches for Low Cost 2.5D Interposers and High Density Fan-Out WLPs
2016
·
Fuhan Liu
, Atsushi Kubo
, et al.
·
IEEE Electronic Components and Technology Conference (ECTC)
·
13
Via-in-Trench: A Revolutionary Panel-Based Package RDL Configuration Capable of 200-450 IO/mm/Layer, an Innovation for More-Than-Moore System Integration
2017
·
Fuhan Liu
, Chandrasekharan Nair
, et al.
·
IEEE Electronic Components and Technology Conference (ECTC)
·
12
Pattern freezing process free litho-litho-etch double patterning
2008
·
Tomoyuki Ando
, Masaru Takeshita
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
12
Progress of topcoat and resist development for 193nm immersion lithography
2006
·
Katsumi Ohmori
, Tomoyuki Ando
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
12
Photocytotoxicity of Water‐soluble Metalloporphyrin Derivatives
1993
·
Tomoyuki Ando
, Kazuhiro Irie
, et al.
·
Photochemistry and Photobiology
·
12
Defect studies of resist process for 193nm immersion lithography
2006
·
Tomoyuki Ando
, Katsumi Ohmori
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
11
Chemically amplified molecular resist based on fullerene derivative for nanolithography
2008
·
Hiroki Yamamoto
, Takahiro Kozawa
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Demonstration of 20 um I/O Pitch RDL Using a Novel, Ultra-Thin Dry Film Photosensitive Dielectric for Panel-Based Glass Interposers
2016
·
Atsushi Kubo
, Chandrasekharan Nair
, et al.
·
IEEE Electronic Components and Technology Conference (ECTC)
·
6
Pattern Freezing Process Free Litho–Litho–Etch Double Patterning
2009
·
Tomoyuki Ando
, Masaru Takeshita
, et al.
·
Japanese Journal of Applied Physics
·
6
PDF
Topcoat-free ArF negative tone resist
2009
·
Tomoyuki Ando
, Sho Abe
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Reliability Studies of 5 µm Diameter Photo Vias with Daisy Chain Resistance Using Dry Film Photosensitive Dielectric Material
2018
·
Atsushi Kubo
, Chandrasekharan Nair
, et al.
·
IEEE Electronic Components and Technology Conference (ECTC)
·
5
Litho-only double patterning approaches: positive–negative versus positive–positive tone
2009
·
Michael M. Crouse
, Ryusuke Uchida
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
5
Immersion-Specific Defects of High-Receding-Angle Topcoat
2010
·
Mamoru Terai
, Teruhiko Kumada
, et al.
·
Japanese Journal of Applied Physics
·
4
PDF
A new method for the measurement of sedimentation potential: rotating column method
1999
·
Masataka Ozaki
, Tomoyuki Ando
, et al.
·
Colloids and Surfaces A Physicochemical and Engineering Aspects
·
4
Fine pitch Cu pillar wafer process development and seed layer etching characterization
2012
·
Li Yan Siow
, Wei Deng
, et al.
·
IEEE Electronics Packaging Technology Conference (EPTC)
·
3
Studies of the mechanism for immersion specific defects
2006
·
Takeo Ishibashi
, Tetsuro Hanawa
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
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Works count:
35
Citation count:
582
H-index:
12
I10-index:
16
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