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H. Wakabayashi
Observed institutions:
NEC (Japan),
City University of Hong Kong,
Sony (Japan),
Sony Semiconductor Solutions Corporation (Japan)
OpenAlex ID:
A5111809360
A 1/1.8-inch 6.4MPixel 60 frames/s CMOS Image Sensor with Seamless Mode Change
2006
·
S. Yoshihara
, M. Kikuchi
, et al.
·
Digest of technical papers/Digest of technical papers - IEEE International Solid-State Circuits Conference
·
92
Extreme High-Performance n- and p-MOSFETs Boosted by Dual-Metal/High-k Gate Damascene Process using Top-Cut Dual Stress Liners on (100) Substrates
2007
·
S. Mayuzumi
, J. Wang
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
19
High-Performance Cu-Interconnects with Novel Seamless Low-k SiOCH Stacks (SEALS) Featured by Compositional Modulation Process for 45nm-Node ULSI Devices
2006
·
M. Tagami
, H. Ohtake
, et al.
·
Symposium on VLSI Technology
·
7
An experimental CMOS photon detector with 0.5e-RMS temporal noise and 15μm pitch active sensor pixels
2017
·
T. Nishihara
, M. Matsumura
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
4
Noise Analysis of a Serial Multiple Sampling in Back-Illuminated CMOS Image Sensor
2016
·
H. Wakabayashi
, K. Yamaguchi
, et al.
·
International Conference on Solid State Devices and Materials (SSDM)
Tinv Scaling and Jg Reducing for nMOSFET with HfSix/HfO2 Gate Stack by Interfacial Layer Formation Using Ozone Water Treatment Process
2007
·
I. Oshiyama
, K. Tai
, et al.
·
International Conference on Solid State Devices and Materials (SSDM)
PMOSFET Vth Modulation Technique using Fluorine Treatment through ALD-TiN Suitable for CMOS Devices
2007
·
K. Tai
, S. Yamaguchi
, et al.
·
International Conference on Solid State Devices and Materials (SSDM)
CMOS devices SOI and multi-gate devices
2006
·
H. Wakabayashi
, S. Biesemans
·
Technical digest - International Electron Devices Meeting/Technical digest
100 MHz, 0.55 mm/sup 2/, 2 mW, 16-b stacked-CMOS multiplier-accumulator
2002
·
H. Igura
, M. Izumikawa
, et al.
·
Custom Integrated Circuits Conference
Intralevel mix and match lithography for sub-100 nm CMOS devices using the JBX-9300FS point-electron-beam system
2002
·
M. Narihiro
, H. Wakabayashi
, et al.
·
International Microprocesses and Nanotechnology Conference (MNC)
Uniform Raised-Salicide Technology for High-Performance CMOS Devices
2002
·
H. Wakabayashi
·
IEICE Transactions on Electronics
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Works count:
12
Citation count:
122
H-index:
4
I10-index:
2
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