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Nobuaki Hayashi

Observed names: HAYASHI, Nobuaki, NOBUAKI HAYASHI, Nobuaki HAYASHI
OpenAlex ID: A5111879006
Determination of acid diffusion in chemical amplification positive deep ultraviolet resists
1991 · Leo Schlegel, Takumi Ueno, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 75
A Novel Water-Soluble Photoinitiator for the Acrylic Photopolymerization Type Resist System
1998 · Kyoko Kojima, Masato Ito, et al. · Chemistry of Materials · 50
Tetrahydropyranyl‐ and furanyl‐protected polyhydroxystyrene in chemical amplification systems
1991 · Simon A. M. Hesp, Nobuaki Hayashi, et al. · Journal of Applied Polymer Science · 36
Hollowing and Transfer of Polymethyl Methacrylate Film Propelled by Laser Ablation of Triazeno Polymer Film
2001 · Takashi Mito, Takuji Tsujita, et al. · Japanese Journal of Applied Physics · 24
Excimer ablation lithography (EAL) for TFT-LCD
1997 · Kenkichi Suzuki, Masaaki Matsuda, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 21
Laser-induced decomposition and ablation dynamics studied by nanosecond interferometry
2001 · Tomokazu Masubuchi, Hiroshi Fukumura, et al. · Journal of Photochemistry and Photobiology A Chemistry · 20
Polymer resist materials for excimer ablation lithography
1998 · Kenkichi Suzuki, Masaaki Matsuda, et al. · Applied Surface Science · 17
Tetrahydropyranyl protected polyhydroxy-styrene for a chemically amplified deep u.v. resist
1992 · Nobuaki Hayashi, Takumi Ueno, et al. · Polymer · 17
Dissolution Behavior of Novolak/Dissolution Inhibitor Resist Systems in an Aqueous Base Developer
1989 · Leo Schlegel, Takumi Ueno, et al. · Japanese Journal of Applied Physics · 17
Acid formation from various sulfonates in a chemical amplification positive resist
1992 · Takumi Ueno, Leo Schlegel, et al. · Polymer Engineering and Science · 13
Novolak resin-based positive electron-beam resist system utilizing acid-sensitive polymeric dissolution inhibitor with solubility reversal reactivity
1991 · Hiroshi Shiraishi, Nobuaki Hayashi, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 13
Chemical amplification positive deep-UV resist using partially tetrahydropyranyl-protected polyvinylphenol
1993 · Takashi Hattori, Leo Schlegel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
Azide–novolak resin negative photoresist for i-line phase-shifting lithography
1991 · Shou-ichi Uchino, Toshihiko Tanaka, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 12
Highly sensitive positive deep-UV resist utilizing a sulfonate acid generator and a tetrahydropyranyl inhibitor
1991 · Leo Schlegel, Takumi Ueno, et al. · Microelectronic Engineering · 12
Negative Resist for i-Line Lithography Utilizing Acid Catalyzed Silanol-Condensation Reaction
1990 · Nobuaki Hayashi, Keiko Tadano, et al. · Japanese Journal of Applied Physics · 12
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A new water-soluble photoresist used a polymeric azide compound as a photosensitizer.
1994 · Hajime Morishita, Masato Ito, et al. · Journal of Photopolymer Science and Technology · 11
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Insolubilization mechanism of a chemical amplification negative-resist system utilizing an acid-catalyzed silanol condensation reaction
1991 · Hiroshi Shiraishi, Emiko Fukuma, et al. · Chemistry of Materials · 11
Bisazidobiphenyls/Novolak Resin Negative Resist Systems for i-Line Phase-Shifting Lithography
1992 · Keiko T. Hattori, Takashi Hattori, et al. · Japanese Journal of Applied Physics · 9
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Chemical amplification negative resist systems composed of novolac, silanols, and acid generators
1990 · Takumi Ueno, Hiroshi Shiraishi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Photochromism of spirooxazine in polymar matrices.
1995 · Kyoko Kojima, Nobuaki Hayashi, et al. · Journal of Photopolymer Science and Technology · 7
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Negative resist systems using acid-catalyzed pinacol rearrangement reaction in a phenolic resin matrix
1991 · Shou-ichi Uchino, Takao Iwayanagi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Polyvinylphenols protected with tetrahydropyranyl group in chemical amplification positive deep-UV resist systems
1991 · Nobuaki Hayashi, Leo Schlegel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Studies on the acid formation and deprotection reaction by novel sulfonates in a chemical amplification positive photoresist.
1990 · Leo Schlegel, Takumi Ueno, et al. · Journal of Photopolymer Science and Technology · 5
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Polyurethane resins as resist materials for excimer ablation lithography (EAL)
1997 · Nobuaki Hayashi, Kenkichi Suzuki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Highly sensitive positive deep UV resist utilizing a sulfonate acid generator and a tetrahydropyranyl inhibitor
1991 · Leo Schlegel, Takumi Ueno, et al. · Microelectronic Engineering · 4
Works count: 86
Citation count: 447
H-index: 12
I10-index: 17
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