Work

Acid formation from various sulfonates in a chemical amplification positive resist

Year: 1992

Type: article

Source: Polymer Engineering and Science

DOI: 10.1002/pen.760322012

Authors: Takumi Ueno, Leo Schlegel, Nobuaki Hayashi, Hiroshi Shiraishi, Takao Iwayanagi

Institution: Hitachi (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2005275848

FWCI:

Cites: 15

Cited by: 13

Related to: 10