Get started
Author

Rishikesh Krishnan

Optical Properties of Colloidal PbSe Nanocrystals
2002 · Hui Du, Chialing Chen, et al. · Nano Letters · 471
On Enhanced Miller Capacitance Effect in Interband Tunnel Transistors
2009 · S. Mookerjea, R. Krishnan, et al. · IEEE Electron Device Letters · 224
Experimental demonstration of 100nm channel length In0.53Ga0.47As-based vertical inter-band tunnel field effect transistors (TFETs) for ultra low-power logic and SRAM applications
2009 · S. Mookerjea, D. Mohata, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 126
22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL
2012 · S. Narasimha, P. Chang, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 95
Toward Increasing FPGA Lifetime
2008 · S. Srinivasan, R. Krishnan, et al. · IEEE Transactions on Dependable and Secure Computing · 83
Impact of aggressive fin width scaling on FinFET device characteristics
2017 · X. He, J. Fronheiser, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 64
A 7nm CMOS technology platform for mobile and high performance compute application
2017 · S. Narasimha, B. Jagannathan, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 62
Polarization Surface-Charge Density of Single Semiconductor Quantum Rods
2004 · Rishikesh Krishnan, Megan A. Hahn, et al. · Physical Review Letters · 58
Modeling Soft Errors at the Device and Logic Levels for Combinational Circuits
2008 · R. Ramanarayanan, V.S. Degalahal, et al. · IEEE Transactions on Dependable and Secure Computing · 50
Scaling deep trench based eDRAM on SOI to 32nm and Beyond
2009 · G. Wang, D. Anand, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 48
22-nm FD-SOI Embedded MRAM Technology for Low-Power Automotive-Grade-l MCU Applications
2018 · K. Lee, R. Chao, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 46
22-nm FD-SOI Embedded MRAM with Full Solder Reflow Compatibility and Enhanced Magnetic Immunity
2018 · K. Lee, K. Yamane, et al. · Symposium on VLSI Technology · 37
Effect of oxidation on charge localization and transport in a single layer of silicon nanocrystals
2004 · R. Krishnan, Q. Xie, et al. · Journal of Applied Physics · 27
PDF
Characterization and optimization of charge trapping in high-k dielectrics
2013 · E. Cartier, T. Ando, et al. · IEEE International Reliability Physics Symposium proceedings · 14
A 0.039um2 high performance eDRAM cell based on 32nm High-K/Metal SOI technology
2010 · N. Butt, K. Mcstay, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 14
High Performance and Yield for Super Steep Retrograde Wells (SSRW) by Well Implant / Si-based Epitaxy on Advanced Technology FinFETs
2019 · U. Rana, D. P. Brunco, et al. · Conference digest · 13
Performance analysis and modeling of deep trench decoupling capacitor for 32 nm high-performance SOI processors and beyond
2012 · Balaji Jayaraman, Sneha Gupta, et al. · IEEE International Conference on IC Design and Technology (ICICDT) · 13
Controlled Nucleation of Silicon Nanocrystals on a Periodic Template
2001 · Christopher C. Striemer, Rishikesh Krishnan, et al. · Nano Letters · 13
Using colloidal gold nanoparticles for studies of laser interaction with defects in thin films
2001 · Semyon Papernov, Ansgar W. Schmid, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Modeling and Characterization of Gate Leakage in High-K Metal Gate Technology-Based Embedded DRAM
2013 · Mohit Bajaj, Rajan K. Pandey, et al. · IEEE Transactions on Electron Devices · 9
The development of nanocrystalline silicon for emerging microelectronic and nanoelectronic applications
2004 · Christopher C. Striemer, Rishikesh Krishnan, et al. · JOM · 7
A novel atomic layer oxidation technique for EOT scaling in gate-last high-к/metal gate CMOS technology
2011 · Min Dai, Jinping Liu, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 6
UV Assisted Densification of Perhydropolysilazane (PHPS) Based Spin-On Glass in High Aspect Ratio Gap Fill Structure
2018 · Sanjay Mehta, Haifeng Sheng, et al. · ECS Transactions · 5
PDF
Hot Carrier Degradation and performance boost on Si Channel nFET Gate-All-Around Nanosheet Devices
2025 · H. Zhou, M. Hasanuzzaman, et al. · IEEE International Reliability Physics Symposium proceedings · 3
Silicon nanocrystals: Structural, electrical and optical properties
2005 · R. Krishnan · PhDT · 2
Works count: 38
Citation count: 1,505
H-index: 14
I10-index: 19
Year
Topic
Type