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Author

Prasanna Dighe

Observed name: P. Dighe
Institution: KLA (United States)
Observed institution: KLA (United States)
OpenAlex ID: A5113004176
Improvement of process control using wafer geometry for enhanced manufacturability of advanced semiconductor devices
2015 · Honggoo Lee, Jongsu Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Use of Surface Haze for Evaluation of Photoresist Residue Removal Efficiency
2009 · S. Halder, R. Vos, et al. · IEEE Transactions on Semiconductor Manufacturing · 9
Evaluation of Post Ion-Implantation Resist Strip with the Background Signal of a Light Scattering Tool
2010 · Sandip Halder, Rita Vos, et al. · Japanese Journal of Applied Physics · 3
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The use of high resolution haze for control of SOI surface roughness in a volume production environment.
2010 · R. Brun, C. Moulin, et al. · IEEE International SOI Conference (SOI) · 2
Study of relationship between 300 mm Si wafer surface and annealing temperatures for advanced semiconductor-based applications
2010 · Andreas Wocko, Sanda Radovanovic, et al. · ASMC proceedings · 2
A proven methodology for detecting photo-resist residue and for qualifying photo-resist material by measuring fluorescence using SP2 bare wafer inspection and SURFmonitor
2009 · David Feiler, Sanda Radovanovic, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Surface Watch Generating High-Speed, Full-Wafer Maps of Surface Microroughness
2006 · Andy Steinbach, Alexander Belyaev, et al. · 2
Using the Background Signal of a Light Scattering Tool for I/I Photo Resist Strip Optimization and Monitoring
2012 · Sandip Halder, Rita Vos, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
Detection of photo resist residue on advanced gate layers using optical scattering and advanced analysis techniques
2010 · Scott Ku, Ying-Hsueh Chang Chien, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 9
Citation count: 33
H-index: 3
I10-index: 1
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