Work

Using the Background Signal of a Light Scattering Tool for I/I Photo Resist Strip Optimization and Monitoring

Year: 2012

Type: article

Source: Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

DOI: 10.4028/www.scientific.net/ssp.187.113

Authors: Sandip Halder, Rita Vos, Masayuki Wada, Martine Claes, Karine Kenis, Paul W. Mertens, Prasanna Dighe, Sanda Radovanovic, Gavin Simpson, Roger Sonnemans

Institutions: IMEC, KLA (United States), Axcelis Technologies (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2047985019

FWCI:

Cites: 1

Cited by:

Related to: 10