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R. Beckmann
Observed names:
Beckmann, R.,
R Beckmann
Observed institutions:
University of Kassel,
Max Planck Society,
Universität Hamburg,
Max Planck Institute for Plasma Physics
OpenAlex ID:
A5113499801
Investigation of the bias nucleation process in microwave plasma-enhanced chemical vapour deposition of diamond
1994
·
R. Beckmann
, B. Sobisch
, et al.
·
Diamond and Related Materials
·
47
Deposition of microcrystalline intrinsic silicon by the Electrical Asymmetry Effect technique
2012
·
D. Hrunski
, F. Mootz
, et al.
·
Vacuum
·
40
The electrical properties of zinc in silicon
1990
·
S. Weiss
, R. Beckmann
, et al.
·
Applied Physics A
·
38
Structure of plasma-deposited amorphous hydrogenated boron-carbon thin films
1998
·
A. Annen
, M. Saß
, et al.
·
Thin Solid Films
·
34
Characterization of the bias nucleation process
1995
·
W. Kulisch
, B. Sobisch
, et al.
·
Diamond and Related Materials
·
34
Deposition and characterization of dense and stable amorphous hydrogenated boron films at low substrate temperatures
1997
·
A Annen
, R Beckmann
, et al.
·
Journal of Non-Crystalline Solids
·
28
On the gas-phase mechanisms in MWCVD and HFCVD diamond deposition
1995
·
R. Beckmann
, B. Sobisch
, et al.
·
Diamond and Related Materials
·
25
Low temperature remote plasma-enhanced deposition of thin metal oxide films by decomposition of metal alkoxides
1991
·
H.J. Frenck
, E. Oesterschulze
, et al.
·
Materials Science and Engineering A
·
25
Stability of plasma-deposited amorphous hydrogenated boron films
1997
·
A. Annen
, M. Saß
, et al.
·
Thin Solid Films
·
24
Influence of gas phase parameters on the deposition kinetics and morphology of thin diamond films deposited by HFCVD and MWCVD technique
1992
·
R. Beckmann
, W. Kulisch
, et al.
·
Diamond and Related Materials
·
24
Investigation of gas phase mechanisms during deposition of diamond films
1993
·
R. Beckmann
, S. Reinke
, et al.
·
Surface and Coatings Technology
·
20
Advanced Anti-Reflection and Passivation Layer Systems Produced by High-Power Plasma in the New Manz PECVD System
2012
·
Schwarz, F.
, Beckmann, R.
, et al.
·
Fraunhofer-Publica (Fraunhofer-Gesellschaft)
·
5
Lithium adsorption on hot oxygen covered tungsten surfaces
1981
·
J. Zegenhagen
, J. Ulbricht
, et al.
·
Surface Science
·
4
High-Power-Plasma PECVD of SiNx and Al2O3 for Industrial Solar Cell Manufacturing
2013
·
Hofmann, M.
, Kohn, N.
, et al.
·
Fraunhofer-Publica (Fraunhofer-Gesellschaft)
·
3
Influence of Gas Phase Parameters on the Deposition Kinetics and Morphology of Thin Diamond Films
1991
·
R. Beckmann
, W. Kulisch
, et al.
·
Materials science monographs
·
2
PECVD Cluster for Manufacturing Gen 5 Silicon Thin Film Tandem Solar Cells
2009
·
Geisler, M.
, Beckmann, R.
, et al.
·
EU PVSEC
·
1
Deposition of microcrystalline intrinsic silicon by EAE technique
2011
·
D. Hrunski
, F. Mootz
, et al.
Herstellung von Diamantfilmen aus der Gasphase
1993
·
R. Beckmann
, Chr. Rau
, et al.
·
Vakuum in Forschung und Praxis
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Works count:
22
Citation count:
359
H-index:
11
I10-index:
11
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