Work

Influence of gas phase parameters on the deposition kinetics and morphology of thin diamond films deposited by HFCVD and MWCVD technique

Year: 1992

Type: article

Source: Diamond and Related Materials

DOI: 10.1016/0925-9635(92)90018-j

Authors: R. Beckmann, W. Kulisch, H.J. Frenck, R. Kassing

Institution: University of Kassel

Language: English

Topic: Diamond and Carbon-based Materials Research

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2003751422

FWCI: 1.407

Cites: 7

Cited by: 24

Related to: 10