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Jun-Sik Bae
Institution:
Samsung Electronics (South Korea)
Observed institution:
Samsung Electronics (South Korea)
OpenAlex ID:
A5113534447
Improvement of metal photo process margin with OPC and CMP for 0.14 μm DRAM technology node and beyond
2001
·
Dong-il Bae
, Jun-Sik Bae
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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