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Sang-Gyun Woo
Observed names:
S. G. Woo,
Sang-Gyun. Woo,
Sang-gyun Woo,
Sanggyun Woo
Institution:
Samsung Electronics (South Korea)
Observed institutions:
Korea Advanced Institute of Science and Technology,
Samsung (South Korea),
Samsung Electronics (South Korea),
Hanyang University
OpenAlex ID:
A5113536050
Trade-off between inverse lithography mask complexity and lithographic performance
2009
·
Byung-Gook Kim
, Sung Soo Suh
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
67
Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
2004
·
Ji-Young Lee
, Jangho Shin
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
49
Mask writing time explosion and its effect on CD control in e-beam lithography
2010
·
Sang Hee Lee
, Jin Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
14
Measurement of the strength of adhesion of resist patterns using an atomic force microscope
2005
·
Sung-Kyoung Kim
, Myoung-Ho Jung
, et al.
·
Nanotechnology
·
13
PDF
Converging lithography by combination of electrostatic layer-by-layer self-assembly and 193nm photolithography: Top-down meets bottom-up
2006
·
Jung Hwan Hah
, Subramanya Mayya
, et al.
·
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
·
12
Simulation and fabrication of attenuated phase-shifting masks: CrF_x
1997
·
Eunah Kim
, Seungbum Hong
, et al.
·
Applied Optics
·
11
PDF
A simulation model for thickness profile of the film deposited using planar circular type magnetron sputtering sources
1996
·
Seungbum Hong
, Eunah Kim
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
11
Effects of gas ring position and mesh introduction on film quality and thickness uniformity
1997
·
Seungbum Hong
, Eunah Kim
, et al.
·
Materials Science and Engineering B
·
10
E-beam shot count estimation at 32 nm HP and beyond
2009
·
Jin Choi
, Sang Hee Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
Attenuated phase-shifting masks of chromium aluminum oxide
1998
·
Eunah Kim
, Seungbum Hong
, et al.
·
Applied Optics
·
9
Spin-on hard mask with dual-BARC property for 50-nm devices
2006
·
Jung Hwan Hah
, Yun Sook Chae
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
8
Strategy for sub-80-nm contact hole patterning considering device fabrication
2004
·
Jin-Young Yoon
, Mitsuhiro Hata
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
8
Layer-specific illumination optimization by Monte Carlo method
2003
·
Ho-Chul Kim
, Dong-Seok Nam
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
8
Optical property simulation of single-layer halftone phaseshifting masks for DUV microlithography
1996
·
Zhong-Tao Jiang
, Seungbum Hong
, et al.
·
Semiconductor Science and Technology
·
8
Analysis of process margin in EUV mask repair with nano-machining
2008
·
Su-Young Lee
, Geun-Bae Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Novel resist material for sub-100-nm contact hole pattern
2000
·
Jeong Hee Chung
, Sang-Jun Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
A new paradigm for haze improvement: retardation of haze occurrence by creating mask substrate insensitive to chemical contamination level
2008
·
Han-Shin Lee
, Jaehyuck Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Substrate effects on the characteristics of haze defect formation on the photomask surface under exposure condition
2007
·
Jaehyuck Choi
, Han-shin Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Macro analysis of line edge and line width roughness
2006
·
Jangho Shin
, Jinyoung Yoon
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns
2005
·
Jangho Shin
, SukJoo Lee
, et al.
·
Optical Microlithography XVIII
·
6
Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)
2005
·
Roman Chalykh
, Seong-Sue Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Most feasible curing process for ArF resists in device integration aspect
2003
·
Hyun-Woo Kim
, Yool Kang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Flare in Microlithographic Exposure Tools
2002
·
Tae Moon Jeong
, Sung-Woon Choi
, et al.
·
Japanese Journal of Applied Physics
·
6
PDF
Design and synthesis of new photoresist materials for ArF lithography
2000
·
Sang-Jun Choi
, Hyun-Woo Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Single-layer halftone phase-shifting masks for DUV microlithography: optical property simulation and chromium compound film preparation
1997
·
Zhong-Tao Jiang
, Seungbum Hong
, et al.
·
Applied Surface Science
·
6
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Works count:
133
Citation count:
483
H-index:
9
I10-index:
8
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