Work

Layer-specific illumination optimization by Monte Carlo method

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.485383

Authors: Ho-Chul Kim, Dong-Seok Nam, Chan Hwang, Young S. Kang, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Institution: Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2108072002

FWCI: 2.243

Cites:

Cited by: 8

Related to: 10