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Young Seog Kang
Observed name:
Young S. Kang
Institution:
Samsung Electronics (South Korea)
Observed institution:
Samsung Electronics (South Korea)
OpenAlex ID:
A5110192222
Lens heating impact analysis and controls for critical device layers by computational method
2013
·
Du Hyun Beak
, Jin Phil Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
16
Improvement of inter-field CDU by using on-product focus control
2014
·
Kyeong Dong Park
, Tony Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
13
Applications of angular scatterometry for the measurement of multiply periodic features
2003
·
Christopher J. Raymond
, Michael E. Littau
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
11
Reticle heating feed-forward control (RHC2) on NXT:1980Di immersion scanner for enhanced on-product overlay
2017
·
Young Ha Kim
, Jonghoon Jang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
8
Overlay improvement methods with diffraction based overlay and integrated metrology
2015
·
Young-Sun Nam
, Sunny Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
8
Layer-specific illumination optimization by Monte Carlo method
2003
·
Ho-Chul Kim
, Dong-Seok Nam
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
8
Focus control budget analysis for critical layers of flash devices
2014
·
Jong Hoon Jang
, Tony Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Scanner-to-scanner CD analysis and control in an HVM environment
2017
·
Du Hyun Beak
, Ju Hee Shin
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Wafer to wafer overlay control algorithm implementation based on statistics
2015
·
Byeong Soo Lee
, Young Seog Kang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Process latitude extension in low k 1 DRAM lithography using specific layer-oriented illumination design
2003
·
Young S. Kang
, Dong-Seok Nam
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Analysis of overlay errors induced by exposure energy in negative tone development process for photolithography
2014
·
Young Ha Kim
, Jang-Sun Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Effectiveness and confirmation of local area flare measurement method in various pattern layouts
2002
·
Dongseok Nam
, Eunmi Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Overcoming low-alignment signal contrast induced alignment failure by alignment signal enhancement
2016
·
Byeong Soo Lee
, Young Ha Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Intra-lot wafer by wafer overlay control using integrated and standalone metrology combined sampling
2016
·
Young Sin Choi
, Young Sun Nam
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Overlay excursion monitoring using SEM image
2002
·
Jeong-Ho Yeo
, Kyoung M. Yang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Optimal lens assignment through measured aberrations
2001
·
Nakgeuon Seong
, Young S. Kang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Improvement of unbalanced illumination induced telecentricity within the exposure slit
2016
·
Jong Hoon Jang
, ByeongSoo Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Process margin improvement through finger-print removal based on scanner leveling data
2017
·
Young Jun Kim
, Tony Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Layout independent leveling (LIL) on NXT:1980Di immersion scanners for enhanced productivity
2017
·
Bram van Hoof
, Arjan Holscher
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
19
Citation count:
96
H-index:
6
I10-index:
3
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