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Scanner-to-scanner CD analysis and control in an HVM environment

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Year: 2017
Type: conference-paper
Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
DOI: 10.1117/12.2258339
Authors: Du Hyun Beak, Ju Hee Shin, Tony Park, Dong Kyeng Han, Jin Phil Choi, Jeong Heung Kong, Young Seog Kang, Se Yeon Jang, Peter Nikolsky, Chris Strolenberg, Noh-Kyoung Park, Khalid Elbattay, Vito Tomasello, Austin Peng, Anand Guntuka, Zhao-Ze Li, Ronald Goossens, Machi Ryu, Jangho Shin, Chung-Yong Kim, Andrew Moe, Yun-A Sung
Institutions: Samsung Electronics (South Korea), ASML (Netherlands)
Language: English

Topic: Advancements in Photolithography Techniques
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences

Open Access status: closed
OpenAlex ID: W2595486271
FWCI: 0.776
Cites: 5
Cited by: 4
Related to: 10
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