Author

Oleh V. Khodykin

Observed names: O V Khodykin, O. Khodykin, O. V Khodykin, O. V. Khodykin, O.V Khodykin, O.V. Khodykin, Oleg Khodykin, Oleg V. Khodykin

Institution: KLA (United States)

Observed institutions: Russian Academy of Sciences, Institute of Spectroscopy, University of Bayreuth, KLA (United States)

OpenAlex ID: A5113540083

EUV discharge light source based on a dense plasma focus operated with positive and negative polarity

2004 · I V Fomenkov, N Böwering, et al. · Journal of Physics D Applied Physics · 50

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LPP EUV source development for HVM

2007 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 42

LPP source system development for HVM

2009 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 37

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Laser-produced plasma light source for EUVL

2010 · Igor V. Fomenkov, Alex I. Ershov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 27

Zinc-tetrabenzoporphyrine-doped poly(methyl methacrylate):?a new photochromic recording medium

1999 · O. V. Khodykin, S. J. Zilker, et al. · Optics Letters · 27

LPP EUV source development for HVM

2006 · Björn A. M. Hansson, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 23

Laser-produced plasma source system development

2007 · Igor V. Fomenkov, David C. Brandt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22

Performance and scaling of a dense plasma focus light source for EUV lithography

2003 · Igor V. Fomenkov, Richard M. Ness, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22

EUV source collector

2006 · Norbert R. Böwering, Alex I. Ershov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18

Laser-produced plasma source system development

2008 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17

Laser-produced plasma light source for EUVL

2009 · Igor V. Fomenkov, David C. Brandt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15

LPP source system development for HVM

2011 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

LPP EUV conversion efficiency optimization

2005 · J. R. Hoffman, A. N. Bykanov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

Optimization of a dense plasma focus device as a light source for EUV lithography

2002 · Igor V. Fomenkov, William N. Partlo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

Laser produced plasma light source for EUVL

2011 · Igor V. Fomenkov, Alex I. Ershov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

LPP source system development for HVM

2010 · David C. Brandt, Igor V. Fomenkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Long-time scale spectral diffusion in polymer glass

2000 · J. Müller, H. Maier, et al. · The Journal of Chemical Physics · 10

Enhanced reflectivity and stability of high-temperature LPP collector mirrors

2008 · Torsten Feigl, Sergiy Yulin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

High power low cost drive laser for LPP source

2006 · Igor V. Fomenkov, Björn A. M. Hansson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Metrology of laser-produced plasma light source for EUV lithography

2005 · N. R. Boewering, J. R. Hoffman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Investigation of spectral diffusion in PMMA on timescales from 10−5 to 104 seconds via transient and photophysical hole burning

1998 · J. Müller, D. Haarer, et al. · Chemical Physics · 7

Development of an in-situ Sn cleaning method for extreme ultraviolet light lithography

2011 · J. Sporre, R. E. Lofgren, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Protection of collector optics in an LPP based EUV source

2005 · C. L. Rettig, O. V. Khodykin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Plasma cleaning of lithium off of collector optics material for use in extreme ultraviolet lithography applications

2007 · Martin J. Neumann, Reece A. DeFrees, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 5

Performance and scaling of a dense plasma focus light source for EUV lithography

2004 · Igor V. Fomenkov, Richard M. Ness, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Works count: 39

Citation count: 453

H-index: 13

I10-index: 17