Work

Protection of collector optics in an LPP based EUV source

Year: 2005

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.601517

Authors: C. L. Rettig, O. V. Khodykin, J. R. Hoffman, W. F. Marx, N. R. Bowering, E. Vargas, A. I. Ershov, I. V. Fomenkov, W. N. Partlo

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1968297032

FWCI: 2.814

Cites:

Cited by: 6

Related to: 10