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J. J. Hsu
Observed name:
Joe Hsu
Institution:
Veeco (United States)
Observed institution:
Veeco (United States)
OpenAlex ID:
A5113581309
Accurate in-line CD metrology for nanometer semiconductor manufacturing
2006
·
Baw-Ching Perng
, Jyu-Horng Shieh
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
90-nm lithography process characterization using ODP scatterometry technology
2004
·
Chih-Ming Ke
, Shinn-Sheng Yu
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
90 nm lithography process characterization using ODP scatterometry technology
2004
·
Chih-Ming Ke
, Shinn-Sheng Yu
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
3
Citation count:
5
H-index:
1
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