Work

90-nm lithography process characterization using ODP scatterometry technology

Year: 2004

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.536123

Authors: Chih-Ming Ke, Shinn-Sheng Yu, Yu-Hsi Wang, Yu-Jun Chou, Jeng-Horng Chen, Bih-Huey Lee, Hong-Yuan Chu, Hua-Tai Lin, Tsai-Sheng Gau, Chih-Hsiang Lin, Yao-Ching Ku, Burn J. Lin, Jacky Huang, J. J. Hsu, Victor Liu, Dave Hetzer, Lip Yap, Wenge Yang, Kaoru Araki

Institutions: Taiwan Semiconductor Manufacturing Company (Taiwan), Tokyo Electron (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Agencia Estatal de Investigación

OpenAlex ID: W1996848877

FWCI: 0.415

Cites:

Cited by: 1

Related to: 10