Author

Jeffrey A. Gregus

Observed names: J. A. Gregus, J. Gregus, J. Greguš, J.A Gregus, J.A. Gregus

Observed institutions: AT&T (United States), Alcatel-Lucent (France), Comenius University Bratislava

OpenAlex ID: A5113587444

Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm

1990 · J. E. Bjorkholm, J. Bokor, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 161

Scaling of Si and GaAs trench etch rates with aspect ratio, feature width, and substrate temperature

1995 · A. D. Bailey, M. C. M. van de Sanden, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 66

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Multiple steady states in electron cyclotron resonance plasma reactors

1993 · Eray S. Aydil, Jeffrey A. Gregus, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 45

Incidence angle distributions of ions bombarding grounded surfaces in high density plasma reactors

1998 · E.S Aydil, B.O.M Quiniou, et al. · Materials Science in Semiconductor Processing · 32

Silicon-on-silicon integration of a GSM transceiver with VCO resonator

2002 · P. Davis, P. Smith, et al. · Digest of technical papers/Digest of technical papers - IEEE International Solid-State Circuits Conference · 24

Electron cyclotron resonance plasma reactor for cryogenic etching

1993 · Eray S. Aydil, Jeffrey A. Gregus, et al. · Review of Scientific Instruments · 23

Real-time, in situ monitoring of surface reactions during plasma passivation of GaAs

1993 · Eray S. Aydil, Zhen Zhou, et al. · Applied Physics Letters · 23

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GaAs and GaN based SAW chemical sensors: acoustic part design and technology

2006 · L. Rufer, T. Lalinsky, et al. · International Conference on Advanced Semiconductor Devices and Microsystems · 12

RF flip-module BGA package

1999 · Y.L. Low, Y. Degani, et al. · IEEE Transactions on Advanced Packaging · 12

Free standing silicon microstructures for soft x-ray masks and cold atom focusing

1990 · D. M. Tennant, J. E. Bjorkholm, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 12

Low-temperature plasma etching of GaAs, AlGaAs, and AlAs

1993 · Jeffrey A. Gregus, Matthew F. Vernon, et al. · Plasma Chemistry and Plasma Processing · 11

Control of an unstable electron cyclotron resonance plasma

1993 · Mark A. Jarnyk, Jeffrey A. Gregus, et al. · Applied Physics Letters · 11

RF flip-module BGA package

2002 · Y.L. Low, Y. Degani, et al. · IEEE Electronic Components and Technology Conference (ECTC) · 6

A novel MCM package for RF applications

2002 · Y. Degani, T.D. Dudderar, et al. · IEEE/CPMT International Electronics Manufacturing Technology Symposium · 5

Chip-scale modules for high-level integration in the 21st century

2002 · Jeffrey A. Gregus, Maureen Y. Lau, et al. · Bell Labs Technical Journal · 5

Memory performance in chip-on-chip packages: Optimizing memory/ASIC integration

2002 · K.J. O'Connor, Y.L. Low, et al. · IEEE Symposium on IC/Package Design Integration · 4

Erratum: Scaling of Si and GaAs trench etch rates with aspect ratio, feature width, and substrate temperature [J. Vac. Sci. Technol. B 13 , 92 (1995)]

1997 · A. D. Bailey, M. C. M. van de Sanden, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 4

Real-time latent image monitoring during holographic fabrication of submicron diffraction gratings

1993 · Jeffrey A. Gregus, Christian A. Green, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 3

Soft x-ray projection lithography: experiments and practical printers

1991 · Donald L. White, John E. Bjorkholm, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

X‐ray reduction imaging at the NSLS

1991 · R.R. Freeman, J.E. Bjorjkholm, et al. · Synchrotron Radiation News · 2

Effect of Non-thermal Plasma Generated at Atmospheric Pressure on Silicon Substrates

2012 · Veronika Medvecká, Anna Zahoranová, et al. · 1

Light scattering methods for semiconductor process monitoring and control

1992 · Richard A. Gottscho, Matthew Vernon, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Real-time, In Situ Monitoring Of Semiconductor Processing

2005 · R.A. Gottscho, E.S. Aydil, et al.

Smooth GaN recess wet photoelectrochemical etching

2005 · D. Gregusova, J. Novak, et al. · International Conference on Advanced Semiconductor Devices and Microsystems