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Author

K. Fujita

Observed names: Kazushi Fujita, Kazushi Fujita Kazushi Fujita
Institution: Fujitsu (Japan)
OpenAlex ID: A5113626762
Advanced channel engineering achieving aggressive reduction of VT variation for ultra-low-power applications
2011 · K. Fujita, Y. Torii, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 59
Proximity focusing RICH with TOF capabilities
2006 · S. Korpar, I. Adachi, et al. · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · 25
A highly integrated 65-nm SoC process with enhanced power/performance of digital and analog circuits
2012 · L. T. Clark, D. Zhao, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 23
A 65 nm CMOS technology with a high-performance and low-leakage transistor, a 0.55 μm/sup 2/ 6T-SRAM cell and robust hybrid-ULK/Cu interconnects for mobile multimedia applications
2004 · S. Nakai, M. Kojima, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 19
A 9 ns 16 Mb CMOS SRAM with offset reduced current sense amplifier
1993 · K. Seno, K. Knorpp, et al. · Digest of technical papers/Digest of technical papers - IEEE International Solid-State Circuits Conference · 19
Studies of a proximity focusing RICH with aerogel radiator for future Belle upgrade
2008 · T. Iijima, I. Adachi, et al. · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · 14
Novel process for SiO2/Si selective etching using a novel gas source for preventing global warming
1999 · Kazushi Fujita, Masafumi Ito, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 10
Proximity focusing RICH with TOF capabilities
2007 · P. Križan, I. Adachi, et al. · Nuclear Physics B - Proceedings Supplements · 8
Environmentally harmonious etching process for cleaning amorphous silicon and tungsten in chemical vapor deposition chamber
1999 · Kazushi Fujita, Shigeto Kobayashi, et al. · Materials Science in Semiconductor Processing · 7
Silicon oxide selective etching process keeping harmony with environment by using radical injection technique
1999 · Kazushi Fujita, Masafumi Ito, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 6
Determination of Mercury by Direct Heating of Mercury-adsorbed Ion-exchange Resin in Electrothermal Atomic Absorption Spectrometry
1979 · Kunio Nakano, Takeo Takada, et al. · Chemistry Letters · 6
Low power CML IC crosspoint switch matrix for space division digital switching networks
1975 · M. Sunazawa, M. Kawakami, et al. · IEEE Journal of Solid-State Circuits · 6
Study of a proximity focusing RICH with a silica aerogel radiator
2007 · I. Adachi, K. Fujita, et al. · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · 4
A study of proximity focusing RICH with aerogel radiator
2007 · I. Adachi, K. Fujita, et al. · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · 4
A burst-mode LSI equalizer with analog-digital building blocks
1984 · Y. Hino, T. Chujo, et al. · Digest of technical papers/Digest of technical papers - IEEE International Solid-State Circuits Conference · 4
Embedded FLOTOX flash on ultra-low power 55nm logic DDC platform
2013 · M. Hori, K. Fujita, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 3
Environmentally benign etching process of amorphous silicon and tungsten using species evaporated from polytetrafluoroethylene and fluorinated ethylene propylene
2002 · Kazushi Fujita, Masaru Hori, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2
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Amorphous Silicon and Tungsten Etching Employing Environmentally Benign Plasma Process
2001 · Kazushi Fujita Kazushi Fujita, Shigeto Kobayashi Shigeto Kobayashi, et al. · Japanese Journal of Applied Physics · 2
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Brain Process: Hardware/Software Complex System Using Logic Circuits in FPGA Array Named Vocalise
2012 · M. Sekine, H. Tamukoh, et al. · Procedia Engineering · 1
Synthesis of Polytetrafluoroethylene-like Films by a Novel Plasma Enhanced Chemical Vapor Deposition Employing Solid Material Evaporation Technique
2003 · Kazushi Fujita, Masafumi Ito, et al. · Japanese Journal of Applied Physics · 1
Silicon oxide contact hole etching employing an environmentally benign process
2002 · Kazushi Fujita, Masaru Hori, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1
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Design study on safety protection system of JSFR
2012 · Naoko Ishikawa, Y. Chikazawa, et al. · OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)
Poly-width-modification method for canceling layout-dependent characteristic variations for low-standby-power CMOS technologies
2009 · Satoshi Nakai, Kazushi Fujita, et al. · ASMC proceedings
Study of RICH Counter with Silica Aerogel Radiator
2006 · A. Kuratani, I. Adachi, et al. · IEEE Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC)
Proximity focusing RICH with TOF capabilities
2006 · S. Korpar, I. Adachi, et al. · IEEE Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC)
Works count: 33
Citation count: 224
H-index: 8
I10-index: 7
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