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K. Ohira

Observed names: K Ohira, Katsumi Ohira
OpenAlex ID: A5113654236
Novel architecture of wavelength interleaving filter with Fourier transform-based MZIs
2002 · T. Chiba, H. Arai, et al. · Optical Fiber Communication Conference · 22
Low-loss arrayed-waveguide grating with high indexregions at slab-to-array interface
2001 · K. Maru, T. Chiba, et al. · Electronics Letters · 6
Refractive-index-adjustment of SiO2–GeO2 films deposited by radio frequency magnetron sputtering
1999 · S Kashimura, M.R Islam, et al. · Applied Surface Science · 6
Development of advanced reticle inspection apparatus for hp 65-nm node device and beyond
2006 · Nobutaka Kikuiri, Shingo Murakami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Performance of novel 198.5-nm wavelength mask inspection system for 65-nm node and beyond optical lithography era
2004 · Dong-Hoon Chung, Katsumi Ohira, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Waveguide interleaving filters
2003 · Takafumi Chiba, Hideaki Arai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance
2004 · Toru Tojo, Ryoich Hirano, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Novel architecture of wavelength interleving filter with Fourier transform-based MZIs
2001 · T. Chiba, H. Arai, et al. · Optical Fiber Communication Conference · 3
Wavelength splitters for DWDM systems
2002 · T. Chiba, H. Arai, et al. · IEEE/LEOS Summer Topical Meetings · 2
Development of simultaneous image acquisition optics with transmitted and reflected light for 45nm (hp) node mask inspection
2005 · R. Hirano, K. Yamashita, et al. · International Microprocesses and Nanotechnology Conference (MNC) · 1
Photomask quality assessment solution for 90-nm technology node
2004 · Katsumi Ohira, Dong Hoon P. Chung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
DUV inspection capability for 90-nm node mask in ArF lithography
2003 · Katsumi Ohira, Byung Gook Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Planar wave-guide interleaving filters
2003 · T. Chiba, H. Arai, et al. · IEEE Lasers and Electro-Optics Society Annual Meeting (LEOS) · 1
Zip file containing the underlying data of the presented results in excel files
2025 · Kenichi Nagae, Yasufumi Asao, et al.
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Optical mask inspection strategy for 65-nm node and beyond
2004 · Dong-Hoon P. Chung, Katsumi Ohira, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 15
Citation count: 58
H-index: 4
I10-index: 1
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