Work

Photomask quality assessment solution for 90-nm technology node

Year: 2004

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.557734

Authors: Katsumi Ohira, Dong Hoon P. Chung, Yoshioka Nobuyuki, Motonari Tateno, Kenichi Matsumura, Jiunn-Hung Chen, Gerard T. Luk-Pat, Norio Fukui, Yoshio Tanaka

Institutions: Semiconductor Leading Edge Technologies, Inc (Japan), NEC (Japan), Synopsys (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2006255371

FWCI: 0.415

Cites:

Cited by: 1

Related to: 10