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Motonari Tateno
Observed names:
Motonari TATENO,
元就 舘野
Observed institutions:
NEC (Japan),
University of Electro-Communications
OpenAlex ID:
A5113737534
Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics
2006
·
Yoshitake Tsuji
, Nobutaka Kikuiri
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Development of advanced reticle inspection apparatus for hp 65-nm node device and beyond
2006
·
Nobutaka Kikuiri
, Shingo Murakami
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Photomask quality assessment solution for 90-nm technology node
2004
·
Katsumi Ohira
, Dong Hoon P. Chung
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
DUV inspection capability for 90-nm node mask in ArF lithography
2003
·
Katsumi Ohira
, Byung Gook Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography
2003
·
Motonari Tateno
, Naohisa Takayama
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Absorption and Laser Characteristics of an UV Tunable Solid State Laser Ce3+ Doped LiSrAlF6.
1996
·
Yoshinori KUBOTA
, Motonari TATENO
, et al.
·
The Review of Laser Engineering
·
1
PDF
レーザ計測 レチクル検査装置lm7000用duv光学系の開発 (レーザ加工・レーザ計測技術特集)
2001
·
元就 舘野
, 進午 村上
, et al.
·
NEC技報
紫外波長可変レーザー結晶Ｃｅ｀３＋´：ＬｉＳｒＡｌＦ６の吸収とレーザー発振特性
1996
·
能徳 久保田
, 元就 舘野
, et al.
·
The Review of Laser Engineering
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Works count:
8
Citation count:
12
H-index:
2
I10-index:
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