Work

Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics

Year: 2006

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.692811

Authors: Yoshitake Tsuji, Nobutaka Kikuiri, Shingo Murakami, Kenichi Takahara, Ikunao Isomura, Yukio Tamura, Kyoji Yamashita, Ryoichi Hirano, Motonari Tateno, Kenichi Matsumura, Naohisa Takayama, Kinya Usuda

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1986403105

FWCI: 2.11

Cites:

Cited by: 4

Related to: 10