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Nobutaka Kikuiri

Observed names: N. Kikuiri, Nobutaka KIKUIRI, 信孝 菊入, 菊入 信孝, 菊入信孝
OpenAlex ID: A5034411429
Development of a new mask pattern inspection tool NPI-7000 and applied results to EUV mask inspection
2012 · Hideaki Hashimoto, Nobutaka Kikuiri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18
Study of EUV mask inspection technique using DUV light source for hp22nm and beyond
2010 · Ryoichi Hirano, Nobutaka Kikuiri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
Evaluation of EUVL-mask pattern defect inspection using 199-nm inspection optics
2007 · Tsuyoshi Amano, Yasushi Nishiyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
A novel defect detection optical system using 199-nm light source for EUVL mask
2010 · Ryoichi Hirano, Nobutaka Kikuiri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Highly reliable 198-nm light source for semiconductor inspection based on dual fiber lasers
2010 · Shinichi Imai, Kazuto Matsuki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
DUV inspection tool application for beyond optical resolution limit pattern
2015 · Hiromu Inoue, Nobutaka Kikuiri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics
2009 · Nobutaka Kikuiri, Masatoshi Hirono, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
X-ray stepper aiming at 0.2 μm synchrotron orbital radiation lithography
1993 · Norio Uchida, Osamu Kuwabara, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 5
Improvement of a DUV mask inspection tool to hand over the baton for next-generation tool smoothly
2013 · Hideaki Hashimoto, Nobutaka Kikuiri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Study of EUVL mask defect inspection using 199-nm inspection tool with super-resolution method
2009 · Hiroyuki Shigemura, Tsuyoshi Amano, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Development of advanced mask inspection optics with transmitted and reflected light image acquisition
2007 · Ryoichi Hirano, Riki Ogawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics
2006 · Yoshitake Tsuji, Nobutaka Kikuiri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Development of advanced reticle inspection apparatus for hp 65-nm node device and beyond
2006 · Nobutaka Kikuiri, Shingo Murakami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Development of tilt servo system using 4-axis lens actuator for disk tilt compensation
1999 · M. Nagasato, Yasuo Motegi, et al. · Joint International Symposium on Optical Memory and Optical Data Storage · 4
Dynamic motion of mask membrane in x-ray stepper
1996 · Norio Uchida, Nobutaka Kikuiri, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 4
Defect printability analysis by lithographic simulation from high resolution mask images
2009 · George Chen, James N. Wiley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
The study of EUVL mask defect inspection technology for 32-nm half-pitch node device and beyond
2008 · Hiroyuki Shigemura, Tsuyoshi Amano, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
A Six Degrees of Freedom Fine Motion Mask Stage for X-Ray Aligner
1993 · N. Kikuiri, N. Uchida, et al. · CIRP Annals · 2
Mask data rank and printability verification function of mask inspection system
2010 · Kenichi Takahara, Masakazu Tokita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Printability verification function of mask inspection system
2009 · Hideo Tsuchiya, Masaki Yamabe, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Evaluation of EUVL mask pattern defect inspection using 199nm inspection tool with super-resolution method
2009 · Hiroyuki Shigemura, Tsuyoshi Amano, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Study of advanced mask inspection optics with super-resolution method for next-generation mask fabrication
2009 · Ryoichi Hirano, Masatoshi Hirono, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Evaluation of defect inspection sensitivity using 199-nm inspection optics
2007 · Tsuyoshi Amano, Yasushi Nishiyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Development of simultaneous image acquisition optics with transmitted and reflected light for 45nm (hp) node mask inspection
2005 · R. Hirano, K. Yamashita, et al. · International Microprocesses and Nanotechnology Conference (MNC) · 1
A dual grating alignment method insensitive to mask-wafer gap variation.
1988 · Norio UCHIDA, Yoriyuki ISHIBASHI, et al. · Journal of the Japan Society for Precision Engineering · 1
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Works count: 36
Citation count: 116
H-index: 5
I10-index: 2
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