Work

Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics

Year: 2009

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.829747

Authors: Nobutaka Kikuiri, Masatoshi Hirono, Ryoichi Hirano, Tsuyoshi Amano, Osamu Suga, Hiroyuki Shigemura, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda

Institutions: Semiconductor Leading Edge Technologies, Inc (Japan), Nuflare Technology, Inc. (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1968474173

FWCI: 0.937

Cites: 7

Cited by: 5

Related to: 10